Copper Sputtering Target

Copper Sputtering Target

Manufacturing Process : Vacuum Melting Technology

Chemical formula : Cu

Melting Point : 1084.62℃

Density:8.96 g.cm³

Specification : Max 4000mm x 300mm ; Or as customers' requirements .

Purity : 99.99% ~99.999%

Application : 

Due to its high electrical conductivity, copper is becoming increasingly popular for use in large-format, high-resolution TFT-LCD television sets. Copper is used as the electrode layer in thin-film transistors. The copper layer controls the individual image dots ( pixels) and therefore determine the quality of the obtained image .

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity