Silicon sputtering target, as a very important functional materials, it mainly used for depositing SiO2, Si3N4 and other dielectric layer by magnetic sputtering process.
Silicon sputtering target, as a very important functional materials, it mainly used for depositing SiO2, Si3N4 and other dielectric layer by magnetic sputtering process. Those thin films are characterized by excellent hardness, optic, dielectric properties, wear and corrosion resistance, which is widely applied to the field of LCD transparent conducting glass, LOW-E building glass and micro-electronics.
| Product Name | Silicon sputtering target |
| Symbol | Silicon |
| Purity | >=99.99% |
| Shape | Planar target, Rotary Target,Arc Target |
| Type | P or N type |
| Bonding service | Bonded are allowed |
| Application | Glass Coating & DecorationLab Research Semiconductors & Micro-Electronics |
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Storage and transportation conditions： Store in dry place, avoid damp, avoid high temperature.
Si Planar Target
Si Rotary Target
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
