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TiAl Sputtering Target

Titanium aluminide (TiAl)-based alloys are developed for high-temperature applications in aerospace and automotive industries because of their attractive properties, such as low density, high specific strength, high specific stiffness, and good high-temperature properties.

Item
Ti-Al Target
Manufacturing Process
Hot Isostatic Pessing
Specification
Maximum 1200*250mm;
Or as customers' requirements .
Relative Density
>99.0%
Purity
99.5%~99.95%(2N5~3N5)
Grain Size
<100μm
Typical Products
Ti-30Al,Ti-50Al,Ti-67Al,Ti-70Al(at%)

Note: 
1)Bonding service is avaliable .

TiAl Sputtering Target

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity


Product Name: TiAl Sputtering Target

Contact Us
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  • Fax.: +86 510 8160 3363
  • Skype: adaxier
  • E-mail: sales@mdlmaterials.com
  • Add.: No.6 Xinyuan Road, Jiangyin City, Jiangsu Province, China, 214400.