Look no further than our CoFeB Cobalt Iron Boron Sputtering Target! With superior purity and excellent performance, this target is perfect for a range of applications. Whether you're working in research, development, or manufacturing, you can trust our CoFeB Cobalt Iron Boron Sputtering Target to deliver consistent results every time.
Product Details:
Introducing our CoFeB Cobalt Iron Boron Sputtering Target – the ultimate solution for your high-quality sputtering needs. This target is manufactured with unparalleled purity and offers exceptional performance, making it the perfect option for a wide range of applications in research, development, and manufacturing. With consistent and reliable results, you can trust our CoFeB Cobalt Iron Boron Sputtering Target to deliver superior performance every time.
Product Features:
- Exceptional Purity – Our CoFeB sputtering target is manufactured with high-quality materials, ensuring exceptional purity and reliable performance for your sputtering requirements.
- Superior Performance – Our CoFeB target offers exceptional performance, ideal for a variety of applications in research, development, and manufacturing. It offers consistent and reliable results, making it an essential component for your sputtering needs.
- Wide Applicability – The CoFeB target is perfect for a wide range of applications, from research and academia to industrial manufacturing and production. Whether you need high-quality sputtering materials for R&D or commercial production, our CoFeB target is the perfect choice.
- Durable Build – Our CoFeB sputtering target is built to last, with a durable design that can withstand even the toughest sputtering environments. It offers exceptional stability and consistency during the sputtering process, providing consistent and reliable results every time.
Applicable Groups:
Our CoFeB Cobalt Iron Boron Sputtering Target is the perfect choice for a wide range of professionals, including:
- Researchers and Academics – Whether you’re conducting research in the field of materials or electronics, our CoFeB target is the ideal choice for your sputtering needs. With exceptional purity and performance, it provides consistent and reliable results you can trust.
- Industrial Manufacturers – Our CoFeB target offers exceptional value for industrial manufacturing and production. It delivers outstanding performance, keeping your production lines running smoothly and efficiently.
- Engineers and Product Developers – Our CoFeB target is an essential component for engineers and product developers who require high-quality sputtering materials for R&D and prototyping. Its exceptional purity and consistent performance provide the perfect foundation for your product development projects.
Applicable Scenarios:
Our CoFeB Cobalt Iron Boron Sputtering Target is ideal for a wide range of scenarios, including:
- Electronics Manufacturing – Whether you need sputtering materials for printed circuit board manufacturing, semiconductor fabrication, or other electronic applications, our CoFeB target delivers exceptional performance and reliability.
- Aerospace and Defense – Our CoFeB target is built to withstand even the toughest sputtering environments, making it the ideal option for aerospace and defense applications. Its superior performance and consistent results provide unmatched value for your critical projects.
- Renewable Energy – Our CoFeB target is perfect for renewable energy applications, providing reliable and consistent results for the manufacture of solar panels, fuel cells, and other clean energy technologies.
Cost Performance:
Our CoFeB Cobalt Iron Boron Sputtering Target offers exceptional cost performance, providing superior results at an affordable price point. With exceptional purity, durability, and consistency, it delivers unmatched value for a wide range of industries and applications.
Order now and discover the advantages of outstanding sputtering materials with our CoFeB Cobalt Iron Boron Sputtering Target.
The CoFeB Cobalt Iron Boron Sputtering Target is a high-quality material made from a unique alloy of cobalt, iron, and boron. This sputtering target is widely used in various industries for thin film deposition processes, such as in the production of magnetic storage devices, sensors, and magnetic recording heads.
This CoFeB sputtering target is manufactured to the highest standards, ensuring its purity and uniformity. It is composed of cobalt, iron, and boron in precise proportions, which gives it excellent magnetic properties and superior performance in sputtering applications. The target is available in various sizes and configurations to meet the specific requirements of different deposition systems.
The CoFeB Cobalt Iron Boron Sputtering Target is suitable for use in both magnetron and ion beam sputtering techniques. It is compatible with a wide range of substrates, including glass, silicon, and metals, making it a versatile option for thin film deposition. The target can be used to deposit thin films with precise thickness and uniformity, resulting in high-quality coatings with excellent adhesion and mechanical properties.
One of the key advantages of using CoFeB Cobalt Iron Boron Sputtering Target is its excellent magnetic properties. The alloy composition of cobalt, iron, and boron gives the target high magnetization and low coercivity, making it ideal for applications that require strong magnetic fields and high sensitivity. The target's magnetic properties can be tailored by adjusting the composition and deposition parameters, allowing for customizing the thin film properties to meet specific requirements.
In addition to its magnetic properties, the CoFeB Cobalt Iron Boron Sputtering Target also offers excellent corrosion resistance and thermal stability. The target is highly durable and can withstand high temperatures and reactive environments, ensuring long-lasting performance in demanding sputtering applications. Its robust construction and high purity make it a reliable choice for achieving consistent and reproducible thin film depositions.
Overall, the CoFeB Cobalt Iron Boron Sputtering Target is a high-performance material that is well-suited for a wide range of sputtering applications. Its unique alloy composition, excellent magnetic properties, and superior performance make it an ideal choice for producing high-quality thin films in various industries. Whether you are working on magnetic storage devices, sensors, or other applications that require precise thin film deposition, the CoFeB Cobalt Iron Boron Sputtering Target can help you achieve exceptional results.
Chemical formula：Co/Fe/B 60/20/20 AT%
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
