We supply various ceramic sputtering targets such as SiO,，SiO2，TiO2,ZrO2，HfO2，TiOx，Ti3O5，Nb2O5，Ta2O5，Y2O3,NbF3，BaF2，CeF3，MgF2， LaF3,YF3，YbF3，ErF3 ,etc...
Si3N4 Silicon Nitride Sputtering Target
Chemical formula：Si3N4
Melting point：1800 ℃
Density：2.2g/cm3
Purity:99.9%
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
