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BaTiO3 Barium Titanate Sputtering Target

BaTiO3 Sputtering Targets are essential materials in the field of thin-film technology due to their unique combination of dielectric, piezoelectric, and ferroelectric properties.

Looking for a reliable and efficient sputtering target for your varied industrial manufacturing and R&D applications? Look no further than our high-quality Barium Titanate (BaTiO3) Sputtering Target. Featuring cutting-edge manufacturing technology and superior performance, our target ensures longevity, reliability, and consistency.


Key Features:


- Consistent Results: Our sputtering targets guarantee consistent and reliable results, owing to the cutting-edge manufacturing technology used in their production.

- High-Quality Material: Our targets are composed of high-quality Barium Titanate (BaTiO3) material that is both reliable and efficient, giving you the best possible results in your industrial manufacturing and R&D applications.

- Easy to Use: Our BaTiO3 sputtering targets are designed to be easily installed and used in your sputtering system.

- Varied Applicable Groups: Our sputtering targets are suitable for a wide range of industries, including the semiconductor, electronics, and optics industries, among others.


Applicable Groups:


Our BaTiO3 Sputtering Targets are the ideal choice for the following groups:


- Semiconductor Industry: Our targets are designed to deliver superior performance in the semiconductor industry, ensuring consistency in the sputtering process.

- Electronics Industry: Our sputtering targets are suitable for a range of electronics applications, including circuit board production and thin film deposition.

- Optics Industry: Our targets are ideal for a range of optics applications, including thin film coatings and mirror deposition.


Applicable Scenarios:


Our BaTiO3 Sputtering Targets are ideal for the following scenarios:


- Research and Development: Our targets are perfect for R&D, enabling researchers to achieve reliable and consistent results in their experiments.

- Industrial Manufacturing: Our sputtering targets are suitable for a range of industrial manufacturing applications, including electronic component production, energy storage systems, and semiconductors.


Cost Performance:


Our BaTiO3 Sputtering Targets are competitively priced, ensuring that you get the best value for your investment. We offer the most competitive prices in the market while maintaining our commitment to quality.


Conclusion:


Order our high-quality Barium Titanate (BaTiO3) Sputtering Targets now and experience excellence in sputtering technology. Our reliable and efficient targets are suitable for a range of industries, including semiconductor, electronics, and optics, among others. With consistent results and competitive pricing, our targets offer the best value for your investment.

BaTiO3 (Barium Titanate) Sputtering Targets are high-purity ceramic materials that are used in a variety of applications, particularly in the field of thin-film technology. These sputtering targets are commonly used in physical vapor deposition (PVD), pulsed laser deposition (PLD), and liquid crystal display (LCD) manufacturing processes to deposit thin films onto substrates for various electronic and optical applications.

BaTiO3 is a ferroelectric material that exhibits excellent dielectric, piezoelectric, and ferroelectric properties, making it highly desirable for use in a range of electronic devices such as capacitors, sensors, actuators, and non-volatile memory devices. With its high dielectric constant, low dielectric loss, and high breakdown voltage, BaTiO3 is an ideal material for high-performance thin-film applications.

BaTiO3 Sputtering Targets are manufactured using high-purity BaTiO3 ceramic materials that are sintered to form dense, uniform targets with consistent composition and microstructure. These targets are available in various shapes and sizes to accommodate different sputtering systems and deposition processes. The targets are designed to be compatible with magnetron sputtering, ion beam sputtering, and other sputtering techniques to deposit thin films with precise control over film thickness, composition, and microstructure.

In PVD processes, BaTiO3 Sputtering Targets are used to deposit thin films of BaTiO3 onto substrates such as silicon, glass, or metal foils to create functional electronic and optical devices. These thin films can be tailored to exhibit specific properties such as ferroelectricity, piezoelectricity, or high dielectric constant, depending on the application requirements.

In PLD processes, BaTiO3 Sputtering Targets are used to create thin films of BaTiO3 by ablating the target material with high-energy laser pulses. This technique allows for precise control over film thickness, composition, and crystallinity, making it suitable for applications that require high-quality thin films with tailored properties.

In LCD manufacturing, BaTiO3 Sputtering Targets are used to deposit thin films of BaTiO3 as the dielectric layer in liquid crystal displays. This dielectric layer helps to improve the performance and reliability of the LCD by reducing cross-talk between adjacent pixels, enhancing optical clarity, and ensuring stable voltage operation.

Overall, BaTiO3 Sputtering Targets are essential materials in the field of thin-film technology due to their unique combination of dielectric, piezoelectric, and ferroelectric properties. These targets enable the production of high-performance electronic and optical devices with enhanced functionality, reliability, and efficiency. Whether for research, development, or large-scale production, BaTiO3 Sputtering Targets offer a versatile and cost-effective solution for achieving thin-film coatings with superior performance characteristics.

BaTiO3 Barium Titanate Sputtering Target

Chemical formula:BaTiO3

Storage and transportation conditions:Store in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

 BaTiO3 Barium Titanate Sputtering Target

 

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity

BaTiO3 Barium Titanate Sputtering Target

Product Name: BaTiO3 Barium Titanate Sputtering Target

Contact Us
  • Tell.: +86 510 8160 3363
  • Fax.: +86 510 8160 3363
  • Skype: adaxier
  • E-mail: sales@mdlmaterials.com
  • Add.: No.6 Xinyuan Road, Jiangyin City, Jiangsu Province, China, 214400.