Bi1.1FeO3 Sputtering Target

Bi1.1FeO3 is a promising material for thin film coatings in various applications due to its unique properties and potential benefits. When used as a sputtering target, Bi1.1FeO3 can create high-quality thin films with excellent performance characteristics.

The Bi1.1FeO3 sputtering target is composed of a mixture of bismuth and iron oxides, carefully designed to achieve the desired stoichiometry of Bi1.1FeO3. This specific composition offers enhanced properties compared to pure BiFeO3, making it a preferred choice for thin film coatings in electronic, magnetic, and optical devices.

One of the key advantages of using Bi1.1FeO3 as a sputtering target is its inherent ferroelectric properties. This makes it ideal for applications requiring ferroelectric materials, such as non-volatile memory devices, piezoelectric sensors, and actuators. The thin films deposited from the Bi1.1FeO3 sputtering target exhibit excellent ferroelectric behavior, with high remanent polarization and low coercive field, allowing for efficient switching and stability in devices.

In addition to its ferroelectric properties, Bi1.1FeO3 also exhibits multiferroic behavior, meaning it possesses both ferroelectric and magnetic properties. This unique combination of properties enables the thin films deposited from the Bi1.1FeO3 sputtering target to be used in novel applications, such as magnetoelectric sensors, spintronic devices, and multifunctional devices that can manipulate both electric and magnetic fields.

The Bi1.1FeO3 sputtering target is manufactured using high-purity materials and advanced processing techniques to ensure the consistency and reliability of the thin films produced. The target is available in various sizes and shapes to accommodate different sputtering systems and deposition processes. It is compatible with both radio frequency (RF) and direct current (DC) sputtering systems, allowing for versatile and efficient thin film deposition.

The thin films deposited from the Bi1.1FeO3 sputtering target exhibit excellent adhesion, uniformity, and crystallinity, making them suitable for a wide range of applications. The films can be deposited on various substrates, including silicon, glass, and flexible substrates, to meet the specific requirements of different devices and applications.

Overall, the Bi1.1FeO3 sputtering target offers a unique combination of ferroelectric and magnetic properties, making it an attractive choice for thin film coatings in advanced electronic, magnetic, and optical devices. With its superior performance characteristics and versatile deposition capabilities, the Bi1.1FeO3 sputtering target is a valuable tool for researchers and engineers looking to develop innovative technologies and devices.

Chemical formula：Bi1.1FeO3

Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature

Shape :Disc,RectangleCurrently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

Please send us your request with below details to " sales@mdlmaterials.com" 
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity