Enhance the performance of your sputtering process with our superior quality Bi2.2WO3 sputtering target. Crafted with the highest-grade materials, our targets have a longer lifespan and provide superior results. Choose from a variety of sizes and styles to cater to your specific requirements.
Our Bi2.2WO3 sputtering target is a high-quality, uniform thin film material that is designed for use in a variety of thin film deposition applications. This target is composed of bismuth tungstate (Bi2.2WO3) which is known for its excellent electrical conductivity, thermal stability, and optical properties.
When used in a sputtering process, this Bi2.2WO3 target produces a thin film coating that is highly transparent, with a high index of refraction and good adhesion to the substrate material. This makes it an ideal choice for applications such as optical coatings, thin film transistors, and anti-reflective coatings.
One of the key advantages of our Bi2.2WO3 sputtering target is its high purity and consistency. Made using state-of-the-art manufacturing techniques, this target is free from impurities that can affect the performance of the thin film coating. This ensures that you get a high-quality, reliable coating every time.
Additionally, our Bi2.2WO3 sputtering target is designed to be compatible with a wide range of sputtering systems, making it easy to integrate into your existing deposition process. Whether you are working with a small laboratory system or a large-scale industrial sputtering machine, you can trust that our target will deliver the performance and reliability you need.
In terms of thin film properties, our Bi2.2WO3 sputtering target offers excellent uniformity and film density. This means that you can achieve a consistent coating thickness across your substrate, resulting in a smooth, uniform surface with minimal defects. This is critical for applications where precise optical or electrical properties are required.
Furthermore, the electrical conductivity of the Bi2.2WO3 thin film produced by our sputtering target is excellent, making it an ideal choice for applications such as thin film transistors, sensors, and electronic components. The high index of refraction of the film also makes it well-suited for optical coatings, where control over light transmission and reflection is important.
Overall, our Bi2.2WO3 sputtering target is a versatile and reliable option for thin film deposition applications. With its high purity, excellent film properties, and compatibility with a wide range of sputtering systems, this target is sure to meet your needs for high-quality, consistent thin film coatings. Trust our Bi2.2WO3 sputtering target to deliver the performance and reliability you need for your next thin film deposition project.
Chemical formula：Bi2.2WO3
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,RectangleCurrently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
