Calcium Ruthenate CaRuO3 Sputtering Target

Calcium Ruthenate (CaRuO3) Sputtering Target is a high-quality thin film deposition material used in physical vapor deposition (PVD) and pulsed laser deposition (PLD) processes. This sputtering target is composed of calcium ruthenate, a compound with the chemical formula CaRuO3, which is known for its excellent electrical, optical, and catalytic properties.The Calcium Ruthenate (CaRuO3) Sputtering Target is designed for use in thin film coating applications where high conductivity, high temperature stability, and corrosion resistance are required. It is commonly used in the semiconductor, electronics, and optical industries to deposit thin films with specific properties for a wide range of applications.

The sputtering target is manufactured using high-purity calcium ruthenate powder that is pressed and sintered to form a dense and uniform target material. This ensures that the target has a high purity and a uniform composition, which is essential for achieving consistent and reliable thin film coatings.

One of the key benefits of using Calcium Ruthenate (CaRuO3) Sputtering Target is its excellent electrical conductivity. Calcium ruthenate is a metal oxide with metallic conductivity, making it an ideal material for applications where high electrical conductivity is required. This makes it suitable for use in electronic devices, sensors, and other applications that require high electrical conductivity.

In addition to its electrical properties, Calcium Ruthenate (CaRuO3) Sputtering Target also exhibits high temperature stability and excellent corrosion resistance. This makes it a durable and long-lasting material for thin film coatings that need to withstand high temperatures and harsh environments. Its high chemical stability also ensures that the thin films deposited using this sputtering target maintain their properties over time.

The Calcium Ruthenate (CaRuO3) Sputtering Target is compatible with a variety of deposition techniques, including magnetron sputtering, ion beam sputtering, and thermal evaporation. This versatility allows for the deposition of thin films with different thicknesses, compositions, and structures, depending on the specific requirements of the application.

Overall, Calcium Ruthenate (CaRuO3) Sputtering Target is an excellent choice for thin film deposition in a wide range of industrial applications. Its high electrical conductivity, temperature stability, and corrosion resistance make it a versatile and reliable material for producing thin films with specific properties. Whether you are looking to deposit coatings for electronic devices, sensors, or optical components, Calcium Ruthenate (CaRuO3) Sputtering Target is an ideal choice for achieving high-quality thin film coatings.

Calcium Ruthenate CaRuO3 Sputtering Target

Chemical formula：CaRuO3

Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity