CaMnO3 Calcium Manganate Sputtering Target

Product Name: CaMnO3 Calcium Manganate Sputtering Target

Looking for exceptional results in your sputtering processes? Look no further than our CaMnO3 Calcium Manganate Sputtering Target. This high-quality target delivers consistent and reliable results, making it the ideal choice for anyone looking to achieve their sputtering goals with ease.

Product Features:

- Exceptional Purity: Our Calcium Manganate Sputtering Target is made with the highest quality materials to ensure exceptional purity for your sputtering needs.

- Uniformity: The target is designed to provide uniform sputtering for consistent results every time.

- Durability: With its exceptional durability, the Calcium Manganate Sputtering Target is designed to last for multiple sputtering cycles.

Applicable Scenarios:

Our Calcium Manganate Sputtering Target is versatile and can be used in a variety of scenarios. These include:

- Thin Film Deposition

- Optical Coating

- Solar Cell Production

- Semiconductor Manufacturing

- Research and Development

Cost Performance:

Our Calcium Manganate Sputtering Target offers excellent cost performance, making it an affordable option for your sputtering needs. You can trust us to deliver the best results every time.

Order now and experience the difference! With our exceptional purity, uniformity, and durability, you can trust our CaMnO3 Calcium Manganate Sputtering Target to deliver consistent and reliable results every time. Don't wait, order today!

CaMnO3, also known as calcium manganate, is a versatile material that is widely used in various applications such as thin film lab research, physical vapor deposition (PVD), and pulsed laser deposition (PLD) coating. The CaMnO3 sputtering target is a key component in the production of high-quality thin films for advanced materials research and development.

The CaMnO3 sputtering target is a high-purity material that is manufactured using advanced sputtering technology. It is composed of carefully selected calcium manganate particles that are sintered together to form a solid, homogeneous target. This ensures that the target has a uniform composition and a smooth surface, which is essential for achieving high-quality thin films.

One of the main advantages of using a CaMnO3 sputtering target is its excellent compatibility with various sputtering techniques, including DC magnetron sputtering, RF sputtering, and reactive sputtering. This allows researchers to easily deposit thin films of CaMnO3 on different substrates, such as silicon wafers, glass, and metal foils, for a wide range of applications.

In thin film lab research, the CaMnO3 sputtering target is used to deposit thin films of calcium manganate on substrates to study the material's properties and behavior under different conditions. Researchers can control the deposition process, including the film thickness, composition, and deposition rate, to tailor the thin films for specific applications. This enables them to explore the potential uses of CaMnO3 in various fields, such as electronics, energy storage, and catalysis.

The CaMnO3 sputtering target is also commonly used in PVD and PLD coating processes to create thin films with specific properties, such as high optical transparency, electrical conductivity, or magnetic properties. By adjusting the deposition parameters, researchers can engineer CaMnO3 thin films with tailored properties for advanced applications, such as sensors, electronic devices, and optical coatings.

The high purity and uniformity of the CaMnO3 sputtering target make it an ideal choice for researchers and engineers working in materials science, nanotechnology, and thin film technology. Its compatibility with different sputtering techniques and ease of use make it a valuable tool for exploring the properties and applications of calcium manganate thin films.

Overall, the CaMnO3 sputtering target is a versatile and reliable material that offers researchers a wide range of possibilities for thin film lab research, PVD, and PLD coating applications. Its high-quality composition, smooth surface, and compatibility with various sputtering techniques make it a valuable asset for advancing materials research and development in the fields of nanotechnology, electronics, and energy.

About Target : The ceramic compound targets are brittle and have poor thermal conductivity . With long time sputtering may cause the target fragmentation . After bonded with copper backing plate ,the thermal conductivity of the compound target can be imporoved ,the working time of the target can be increased . And the target with bonding can be still used even it cracked during sputtering . We highly recommend the compound target to be bonded when ordering .

About Bonding :

Bonding material : Indium or Elastomer 

Bonding thickness : 0.1mm around for the bonding thickness 

Bonding backing plate :OFHC copper ,Molybdenum and Stainless steel

Notice : Indium melting point is around 156 degree ,it may melted if the working temperature is over the melting point . 

Advantage of bonding : 

1.Good protection of the fragile targets when transportation .

2.Bonding can fix the problem of target sizes limitation .

3. Making the target has better cooling when sputtering ,which can avoid the uneven sputtering and target cracking when sputtering .

4. Making the targets has better thermal conductivity with bonding .

About working :

The ceramic compound target & sintering alloy target are fraigle ,they may break when high powder sputtering ,suggestive sputtering power is not over 3W/cm2

Check with us " sales@mdlmaterials.com " with below details for more details .