CeO2 Cerium Oxide Sputtering Target With Copper backing Plate

Applicable Groups:

- Researchers and Scientists involved in thin-film deposition and sputtering.

- Professionals in the semiconductor, solar, and biomedical industries.

Applicable Scenarios:

- Semiconductor fabrication and device processing.

- Solar cell and photovoltaic manufacturing.

- Biomedical research and diagnostics.

Product Cost Performance:

- High-quality sputtering target with copper backing at a competitive price in the market.

- Long-lasting performance with minimal maintenance and replacement costs.

In Conclusion:

Experience the outstanding performance and precision of the CEO2 Cerium Oxide Sputtering Target with Copper Backing Plate. This top-notch product is designed to deliver exceptional accuracy in various applications, ensuring uninterrupted productivity and the ultimate in quality engineering. Order now to witness the high-quality engineering and performance of this sputtering target.

The CeO2 Cerium Oxide Sputtering Target with Copper backing Plate is a high-quality, durable product that is essential for use in a wide range of sputtering applications. This sputtering target is made from 99.99% pure CeO2 cerium oxide, ensuring that you get the highest quality results every time you use it.

The use of CeO2 cerium oxide in sputtering applications is very important, as it offers a number of key benefits. One of the main advantages of using this material is its high density, which allows for efficient sputtering processes and ensures that you get a consistent coating every time. Additionally, CeO2 cerium oxide is known for its excellent thermal stability and chemical resistance, making it an ideal choice for demanding sputtering applications.

The inclusion of a copper backing plate with this sputtering target provides additional benefits. The copper backing plate helps to dissipate heat more effectively during the sputtering process, reducing the risk of overheating and ensuring a more stable coating. Additionally, the copper backing plate helps to improve the overall conductivity of the sputtering target, further enhancing its performance.

In addition to its technical advantages, the CeO2 Cerium Oxide Sputtering Target with Copper backing Plate is also very easy to use. The target is designed for compatibility with a wide range of sputtering systems, ensuring that you can easily integrate it into your existing processes. The target is also very easy to install and replace, allowing for quick and hassle-free maintenance.

This sputtering target is available in a variety of sizes and configurations, making it suitable for a wide range of applications. Whether you are working in research and development, or in a large-scale industrial setting, this sputtering target can meet your needs. Additionally, custom sizes and configurations are available upon request, allowing you to get a sputtering target that is tailored to your specific requirements.

Overall, the CeO2 Cerium Oxide Sputtering Target with Copper backing Plate is a high-quality, reliable product that is essential for sputtering applications. With its high purity, excellent thermal stability, and easy-to-use design, this sputtering target is sure to meet your needs and provide excellent results every time you use it. Upgrade your sputtering processes with the CeO2 Cerium Oxide Sputtering Target with Copper backing Plate.

Chemical formula：CeO2

Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity