Introducing our Indium Tin Oxide ITO In2O3/SnO2 90/10 wt % sputtering target! This high-quality material boosts your thin film coating techniques, ensuring consistent and reliable performance in various applications. Achieve superior results in your thin film projects with our top-of-the-line product. Order now!
1.Product Details:
Introducing our Indium Tin Oxide (ITO) In2O3/SnO2 90/10 wt % sputtering target, which is an excellent material for thin film coating. This product is designed to enhance your thin film coating techniques and ensures consistent and reliable performance in a wide range of applications.
Features:
- High-quality material: Our Indium Tin Oxide ITO In2O3/SnO2 90/10 wt % sputtering target is made of high-quality materials that guarantee superior performance.
- Superior results: With our top-of-the-line product, you can achieve superior results in your thin film projects.
- Enhanced thin film coating techniques: Our product helps to enhance your thin film coating techniques for optimal results.
Applicable Groups:
Our Indium Tin Oxide ITO In2O3/SnO2 90/10 wt % sputtering target is perfect for scientists, researchers, engineers, and technicians working in the fields of thin film coating, electronics, and semiconductors.
Applicable Scenarios:
This product is designed for use in thin film coating applications such as solar cells, flat panel displays, touch screens, and more.
Cost Performance:
Our Indium Tin Oxide ITO In2O3/SnO2 90/10 wt % sputtering target is competitively priced, making it an excellent cost-effective option for thin film coating applications.
Order Now:
Order now and experience the superior performance of our Indium Tin Oxide ITO In2O3/SnO2 90/10 wt % sputtering target in your thin film projects.
The Indium Tin Oxide (ITO) In2O3/SnO2 90/10 wt % Sputtering Target is a high-quality material specifically designed for use in transparent conductive coatings for displays such as liquid crystal displays (LCDs) and OLED displays. This sputtering target is made up of a precise combination of indium oxide (In2O3) and tin oxide (SnO2) in a ratio of 90% to 10% by weight, ensuring optimal performance and durability.
One of the key features of the ITO In2O3/SnO2 sputtering target is its excellent electrical conductivity and transparency. The indium tin oxide material is known for its high electrical conductivity, making it an ideal choice for applications where a transparent conductive coating is required. This sputtering target allows for the efficient transfer of electrical current while maintaining high optical transparency, making it perfect for use in displays where visibility and conductivity are essential.
In addition to its electrical and optical properties, the ITO In2O3/SnO2 sputtering target is also highly durable and resistant to wear and tear. This ensures that the transparent conductive coating will remain intact and functional even under harsh conditions, extending the lifespan and reliability of the display.
Furthermore, the sputtering target is designed for easy and efficient deposition onto substrates using a sputtering process. Sputtering is a widely used technique for depositing thin films of material onto a substrate, and the ITO In2O3/SnO2 sputtering target ensures uniform and precise coating with minimal waste. This allows for the production of high-quality transparent conductive coatings with excellent performance and consistency.
The ITO In2O3/SnO2 sputtering target is specifically tailored for use in the production of displays such as LCDs and OLEDs. LCDs rely on transparent conductive coatings to create the pixel matrix that forms the images on the screen, and the high electrical conductivity and optical transparency of the ITO In2O3/SnO2 sputtering target make it an ideal material for this application.
OLED displays, on the other hand, require transparent conductive coatings for the production of organic light-emitting diodes that emit light when an electric current is applied. The ITO In2O3/SnO2 sputtering target provides the necessary electrical conductivity and transparency to ensure the efficient functioning of OLED displays, resulting in bright, vibrant, and energy-efficient screens.
Overall, the ITO In2O3/SnO2 90/10 wt % Sputtering Target is a high-performance material that is well-suited for use in transparent conductive coatings for displays such as LCDs and OLEDs. Its combination of electrical conductivity, optical transparency, durability, and ease of deposition makes it an excellent choice for manufacturers looking to produce high-quality displays with superior performance and longevity.
2.Product Characteristics
2.1 .Chemical formula : In2O3/SnO2
2.2 .Appearance : Black lump ceramic target
2.3 .Purity: ≥99.99%(Al,Fe,Cu,Ni,Pbamount ≤80ppm)
2.4 .Grain size : 5~15um
2.5. Relative density : ≥99.5%
2.6. Electrical resistivity: <1.2*10-4Ω▪cm
2.7. Thermal coefficient of expansion : 5.8*10-6 K-1
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
