High Chemical Stability: Our premium LiF sputtering target boasts excellent chemical stability, ensuring a reliable and efficient deposition process for your thin film coating needs.
The LiF lithium fluoride sputtering target is a high-quality thin film deposition material designed for use in physical vapor deposition (PVD) and pulsed laser deposition (PLD) processes. This sputtering target is composed of pure lithium fluoride (LiF) material, which is known for its excellent optical and electronic properties, making it an ideal choice for a wide range of thin film coating applications.
With a purity level of 99.99%, this LiF lithium fluoride sputtering target ensures high performance and consistent results in thin film deposition processes. The high purity of the material minimizes impurities and defects in the deposited thin films, resulting in excellent film quality and uniformity.
One of the key advantages of using the LiF lithium fluoride sputtering target is its ability to deposit thin films with precise thickness and excellent adhesion to the substrate. This makes it an ideal choice for applications where thin film coatings need to be highly uniform and consistent, such as in the production of optical coatings, semiconductor devices, and protective coatings.
The LiF lithium fluoride sputtering target is compatible with a wide range of sputtering systems, allowing for easy integration into existing deposition setups. Its high thermal stability and excellent sputtering efficiency make it a reliable and cost-effective choice for thin film deposition processes.
In addition to its optical and electronic properties, the LiF lithium fluoride sputtering target also offers good chemical and mechanical stability, making it suitable for use in challenging environments. Whether you are applying thin films in high vacuum conditions or in the presence of reactive gases, this sputtering target is up to the task.
Overall, the LiF lithium fluoride sputtering target is a versatile and high-performance material that can meet the needs of a variety of thin film coating applications. Its high purity, excellent film quality, and compatibility with different sputtering systems make it a valuable addition to any thin film deposition process.
In conclusion, the LiF lithium fluoride sputtering target is a reliable and high-quality material that offers excellent performance in thin film deposition processes. Whether you are working on research projects, developing new technologies, or manufacturing commercial products, this sputtering target can help you achieve superior results in your thin film coating applications.
Chemical formula：LiF
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
