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LiTaO3 Lithium Tantalate Sputtering Target

Introducing the LiTaO3 Lithium Tantalate Sputtering Target – the perfect solution for precision and accuracy in your projects. Our target is made of the highest quality, with excellent adhesion and uniformity. It's ideal for a wide range of applications and suitable for multiple industries, including electronics, optics, and telecom.

The LiTaO3 Lithium Tantalate Sputtering Target is a high-quality thin film coating material that is used in various industries such as electronics, telecommunications, and aerospace. This sputtering target is made from lithium tantalate (LiTaO3), which is a compound consisting of lithium, tantalum, and oxygen atoms. LiTaO3 is known for its excellent piezoelectric, pyroelectric, and ferroelectric properties, making it an ideal material for use in surface acoustic wave devices, sensors, resonators, and optical waveguides.

The LiTaO3 sputtering target is manufactured using a high-purity process to ensure the best quality and performance. The target is available in various sizes and shapes to fit different sputtering systems and applications. The sputtering target is composed of a dense, uniform structure that ensures a consistent and reliable coating deposition.

One of the main advantages of using the LiTaO3 sputtering target is its high deposition rate, which allows for efficient and fast coating of substrates. The thin film coatings produced from the LiTaO3 sputtering target exhibit excellent adhesion, uniformity, and stability, making them ideal for use in various thin film deposition techniques such as physical vapor deposition (PVD), pulsed laser deposition (PLD), and liquid crystal displays (LCD).

In PVD processes, the LiTaO3 sputtering target is used to create thin films with high purity and precision. The target is mounted in a sputtering system, where it is bombarded with high-energy ions to release LiTaO3 atoms that are deposited onto a substrate to form a thin film coating. The resulting thin films exhibit excellent electrical, optical, and mechanical properties, making them suitable for a wide range of applications.

In PLD processes, the LiTaO3 sputtering target is employed to produce thin films with controlled stoichiometry and composition. The target is ablated using a high-energy laser beam to generate a plasma plume that is deposited onto a substrate to form a thin film coating. The thin film coatings produced from the LiTaO3 sputtering target in PLD processes exhibit high crystallinity and superior film quality, making them suitable for advanced electronic and optical devices.

In LCD manufacturing, the LiTaO3 sputtering target is used to produce thin film coatings on glass substrates for the fabrication of liquid crystal displays. The target is sputtered onto the glass substrates to create transparent conductive oxide layers that enable the operation of the display. The thin film coatings produced from the LiTaO3 sputtering target in LCD applications exhibit excellent conductivity, transparency, and durability, making them ideal for use in high-performance displays.

Overall, the LiTaO3 Lithium Tantalate Sputtering Target is a versatile and high-performance material that is ideal for use in various thin film coating applications. Its excellent properties and performance make it a preferred choice for industries seeking high-quality thin film coatings for their advanced electronic, optical, and communication devices. Whether used in PVD, PLD, or LCD applications, the LiTaO3 sputtering target delivers consistent and reliable performance, making it a valuable material for thin film deposition processes.

Applicable Groups:

- Electronics industries

- Optics industries

- Telecommunications industries

- Research and development institutions

- Universities


Applicable Scenarios:

- Thin film deposition

- Optical coating

- Conductive coatings

- Semiconductor fabrication

- Data storage

LiTaO3 Lithium Tantalate Sputtering Target

Chemical formulaLiTaO3

Storage and transportation conditionsStore in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

 

 LiTaO3 Lithium Tantalate Sputtering Target

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity

LiTaO3 Lithium Tantalate Sputtering Target


Product Name: LiTaO3 Lithium Tantalate Sputtering Target

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  • Fax.: +86 510 8160 3363
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  • E-mail: sales@mdlmaterials.com
  • Add.: No.6 Xinyuan Road, Jiangyin City, Jiangsu Province, China, 214400.