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Lutetium iron oxide sputtering target

Our lutetium iron oxide sputtering target is expertly crafted using high-quality materials and precise compositions, making it an ideal choice for commercial and industrial applications. Its efficiency and durability make it a great investment for those seeking a long-lasting and efficient product. Order now and experience the superior performance

Lutetium iron oxide, also known as lutetium ferrite or Lu-Fe-O, is a unique material that offers a range of applications in various industries, particularly in the field of thin film coating technology. This compound possesses a combination of properties that make it an ideal candidate for use in sputtering targets for physical vapor deposition (PVD), pulsed laser deposition (PLD), and liquid crystal display (LCD) technologies.

Lutetium iron oxide has a chemical formula of Fe5Lu3O12, Lu3Fe5O12, Fe2LuO4, or Lu3Fe5O12, depending on the specific ratio of iron, lutetium, and oxygen atoms in the compound. This composition gives the material its unique properties, including high thermal stability, excellent electrical conductivity, and strong magnetic properties. These characteristics make lutetium iron oxide an attractive material for a variety of applications, including magnetic storage media, spintronics, and magnetic sensors.

When used as a sputtering target for thin film coating, lutetium iron oxide offers several advantages over other materials. The compound's high thermal stability allows for the deposition of thin films at high temperatures, resulting in improved film quality and adhesion to the substrate. Additionally, lutetium iron oxide's excellent electrical conductivity ensures uniform film deposition with minimal defects or impurities. These properties make lutetium iron oxide an ideal choice for applications requiring thin films with precise thickness and composition.

In PLD and PVD processes, lutetium iron oxide sputtering targets are used to deposit thin films of the material onto substrates such as silicon, glass, or metal. The sputtering process involves bombarding the target material with high-energy ions, causing atoms to be ejected from the target and deposited onto the substrate, creating a thin film. Lutetium iron oxide sputtering targets are designed to provide a consistent and homogeneous deposition of the material, ensuring high-quality film growth and reproducible results.

In the field of LCD technology, lutetium iron oxide thin films are used as transparent conductive coatings on glass substrates. These films have excellent optical properties, including high transparency and low reflectivity, making them ideal for use in displays and touchscreens. Lutetium iron oxide thin films also exhibit good adhesion to glass and other substrates, ensuring long-term stability and durability in LCD applications.

Overall, lutetium iron oxide sputtering targets are a versatile and reliable choice for thin film coating applications in a variety of industries. With their unique combination of properties, including high thermal stability, excellent conductivity, and strong magnetic properties, lutetium iron oxide targets offer superior performance and quality in PLD, PVD, and LCD technologies. Whether used for magnetic storage media, spintronics, or display applications, lutetium iron oxide sputtering targets provide exceptional results and reliable performance for a wide range of thin film coating needs.


Product Features:


- High-quality materials: Our Lutetium Iron Oxide (LuFeO3) sputtering target is made of premium quality materials for unparalleled durability and longevity.

- Precise composition: Our product boasts precise compositions that are perfect for a wide range of commercial and industrial applications.

- Product efficiency: Our product is highly efficient in performance, making it an excellent choice for high-end industrial processes.

- Durability: Our product is highly durable, making it resistant to wear and tear, and long-lasting even in harsh work environments.

Lutetium iron oxide sputtering target

Chemical formula:Fe5Lu3O12, Lu3Fe5O12, Fe2LuO4, Lu3Fe5O12, Lu-Fe-O, Fe-Lu-O

Storage and transportation conditionsStore in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

 Lutetium iron oxide sputtering target

 

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity

Lutetium iron oxide sputtering target




Product Name: Lutetium iron oxide sputtering target

Contact Us
  • Tell.: +86 510 8160 3363
  • Fax.: +86 510 8160 3363
  • Skype: adaxier
  • E-mail: sales@mdlmaterials.com
  • Add.: No.6 Xinyuan Road, Jiangyin City, Jiangsu Province, China, 214400.