MgO (Magnesium Oxide) sputtering targets are essential materials used in thin film deposition processes for various applications in industries such as electronics, optics, and semiconductors. These targets are favored for their high purity, excellent thermal stability, and superior electrical properties.
Order now and experience unparalleled efficiency, high performance, and superior quality in your magnesium oxide sputtering targets. With our cutting-edge technology and unmatched production quality, you can stay ahead of the competition and achieve maximum yield in your thin film deposition and photovoltaic cell manufacturing processes.
MgO (Magnesium Oxide) sputtering targets are essential materials used in thin film deposition processes for various applications in industries such as electronics, optics, and semiconductors. These targets are favored for their high purity, excellent thermal stability, and superior electrical properties.
MgO sputtering targets are commonly used in physical vapor deposition (PVD) and pulsed laser deposition (PLD) techniques to create thin films on substrates such as glass, silicon, and metals. These thin films are highly sought after for their high dielectric strength, optical clarity, and resistance to chemical and thermal degradation.
One of the key advantages of MgO sputtering targets is their ability to produce thin films with precise thickness and uniformity. This makes them ideal for applications in the manufacture of electronic components, flat panel displays, and optical coatings. MgO thin films can also be used as buffer layers in semiconductor devices and as protective coatings for sensitive materials.
In the LCD industry, MgO sputtering targets are utilized to deposit thin films on glass substrates for the production of high-resolution displays with excellent color reproduction and contrast. The optical properties of MgO thin films make them well-suited for use in LCD panels, where they help to enhance brightness and reduce glare.
Furthermore, MgO sputtering targets are crucial components in the production of thin-film transistors (TFTs) used in modern display technologies. These targets enable the deposition of high-quality insulating layers that help to improve the performance and longevity of TFT devices.
When it comes to PVD and PLD processes, the quality of the sputtering target plays a critical role in determining the properties of the thin film. MgO sputtering targets are manufactured using high-purity magnesium oxide materials that ensure the deposition of films with exceptional chemical and structural integrity.
In addition to their applications in electronics and optics, MgO sputtering targets are also used in the development of advanced materials for energy storage, catalysis, and sensor technologies. These targets have been found to exhibit excellent resistance to corrosion and oxidation, making them ideal for use in harsh environments.
Overall, MgO sputtering targets are indispensable tools for researchers and manufacturers looking to create high-performance thin films for a wide range of applications. With their unique combination of properties and reliability, MgO sputtering targets continue to play a key role in advancing the fields of electronics, optics, and materials science.
Features:
- High Purity: Our MgO sputtering targets consist of 99.99% pure magnesium oxide, ensuring optimum quality.
- Particle Distribution: Uniform particle distribution, suitable for a variety of deposition techniques.
- High Density: Our targets are highly dense, resulting in excellent performance and yield.
- Low Trace Element Content: Minimized trace element content, suitable for a variety of applications.
- Easy to Install: Our targets are easy to install, requiring minimal labor, resulting in maximum productivity.
Applicable Groups:
Our MgO sputtering targets are suitable for researchers, industries, and manufacturers requiring the use of magnesium oxide thin films in their products, such as:
- Solar Cell Industries
- Semiconductor Manufacturing
- Aerospace and Defence Industries
- Energy Research and Development
- Thin Film Coating and Deposition Industries
Applicable Scenarios:
MgO magnesium oxide sputtering targets can be applied to a wide range of scenarios, such as:
- Making solar cells.
- Manufacturing display devices and flat panel displays.
- Creating magnetic recording media.
- Producing hard coatings for automotive glass, architectural and decorative coatings.
- Developing new materials and for cutting-edge research in nanotechnology.
Chemical formula：MgO
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
