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MnO2 Manganese Dioxide Sputtering Target

Introducing our MnO2 Sputtering Target, a high-quality solution that delivers superior results in sputtering operations. Made with high-purity materials, this target is perfect for various applications. Order now and experience the difference for yourself!

Our MnO2 Sputtering Target is a high-quality solution that delivers superior results in sputtering operations. Made with high-purity materials, this target is perfect for various applications and offers exceptional cost performance. It is suitable for a range of industries and scenarios, making it an ideal choice for anyone who needs high-quality sputtering operations. Order today and experience the difference for yourself!

Manganese dioxide is a versatile compound that has found applications in a wide range of industries, including electronics, batteries, ceramics, and pigments, among others. One of the most interesting uses of manganese dioxide is in the manufacturing of thin film coatings for various applications. In particular, manganese dioxide sputtering targets are used in physical vapor deposition (PVD) and pulsed laser deposition (PLD) processes to create high-quality manganese dioxide thin films.

Manganese dioxide thin films have unique properties that make them highly desirable for a variety of applications. Among these properties are high thermal stability, excellent electrical conductivity, and strong adherence to substrates. These characteristics make manganese dioxide thin films ideal for use in a variety of electronic and optical devices, such as sensors, capacitors, and solar cells.

One of the key advantages of using manganese dioxide sputtering targets in PVD and PLD processes is their ability to produce thin films with precise control over thickness and composition. This level of control is essential for creating thin films with specific properties and performance characteristics. Additionally, manganese dioxide thin films deposited using sputtering targets have excellent uniformity and reproducibility, which is crucial for achieving consistent results in manufacturing processes.

Another important benefit of using manganese dioxide sputtering targets is their compatibility with a wide range of substrate materials. Whether the substrate is made of glass, silicon, or a flexible polymer, manganese dioxide thin films can be reliably deposited on the surface with high precision and minimal defects. This versatility makes manganese dioxide sputtering targets a valuable tool for researchers and manufacturers looking to develop innovative solutions in various fields.

In addition to their technical advantages, manganese dioxide sputtering targets offer cost-effective and environmentally friendly solutions for thin film deposition. The high material efficiency of sputtering processes minimizes waste and reduces production costs, making manganese dioxide thin films an attractive option for large-scale manufacturing applications. Furthermore, the use of sputtering targets eliminates the need for hazardous chemicals and solvents, leading to a safer and more sustainable production process.

Overall, manganese dioxide sputtering targets are a versatile and effective tool for creating high-quality thin films with unique properties and performance characteristics. Whether used in the production of electronic devices, sensors, or coatings, manganese dioxide thin films offer a wide range of benefits for researchers and manufacturers seeking innovative solutions in their respective fields. With their excellent thermal stability, electrical conductivity, and substrate compatibility, manganese dioxide thin films deposited using sputtering targets are sure to play a significant role in the advancement of materials science and technology in the years to come.


Our MnO2 Sputtering Target is suitable for use in a range of scenarios, including the following:


- Sputtering operations

- Thin film deposition

- Plasma displays and televisions

- Coating of optical lenses and mirrors

- Decorative coatings

MnO2 Manganese Dioxide Sputtering Target

Material : MnO2

Color : Dark Grey

Storage and transportation conditions:Store in dry place, avoid damp, avoid high temperature


Shape :Disc,Rectangle


Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.


MnO2 Manganese Dioxide Sputtering Target

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity


MnO2 Manganese Dioxide Sputtering Target


Product Name: MnO2 Manganese Dioxide Sputtering Target

Contact Us
  • Tell.: +86 510 8160 3363
  • Fax.: +86 510 8160 3363
  • Skype: adaxier
  • E-mail: sales@mdlmaterials.com
  • Add.: No.6 Xinyuan Road, Jiangyin City, Jiangsu Province, China, 214400.