Molybdenum trioxide is chemical compound with the formula MoO₃. This compound is produced on the largest scale of any molybdenum compound. It is an intermediate in the production of molybdenum metal. It is also an important industrial catalyst. Molybdenum trioxide occurs as the rare mineral molybdite.
Molybdenum trioxide (MoO3) sputtering targets are essential components in the production of thin films used in various industries such as semiconductor, solar cell, and optical coating. These targets are made from high purity molybdenum trioxide, a versatile material known for its excellent optical and electrical properties.
Molybdenum trioxide sputtering targets are manufactured using advanced techniques to ensure uniformity and high quality. The targets are available in various shapes and sizes to meet the specific requirements of different sputtering systems. They can be used in both DC and RF sputtering processes, allowing for precise control over deposition rates and film thickness.
One of the key advantages of using molybdenum trioxide sputtering targets is their high purity and excellent stoichiometry. This results in films with superior optical and electrical properties, making them ideal for applications that require high precision and reliability. The targets are also highly resistant to corrosion and oxidation, ensuring long-lasting performance even in harsh operating conditions.
In addition, molybdenum trioxide sputtering targets offer excellent adhesion to substrates, allowing for the deposition of thin films with good mechanical strength and durability. This makes them ideal for use in a wide range of applications, including anti-reflective coatings, transparent conductive films, and optical filters.
Furthermore, molybdenum trioxide sputtering targets can be easily customized to meet specific requirements, such as size, shape, and composition. This flexibility allows for the production of high-quality thin films with tailored properties for a wide range of applications.
Overall, molybdenum trioxide sputtering targets offer exceptional performance and reliability, making them an essential component in the production of advanced thin films. With their high purity, excellent stoichiometry, and superior properties, these targets are the ideal choice for achieving precise and consistent results in various sputtering applications.
For all your molybdenum trioxide sputtering target needs, look no further than our high-quality products. Contact us today to learn more about our range of molybdenum trioxide sputtering targets and how they can benefit your specific application requirements.
MoO3 Sputtering Target
Product Name : Molybdenum Trioxide
Chemical formula：MoO3
Melting point：800 ℃
Density：3.64 g/cm3
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
