Introducing our premium selection of MoSe2 Molybdenum Diselenide Sputtering Targets! Made with top-quality materials, our targets offer unrivaled performance and reliability in any sputtering application. With a wide array of sizes and specs, you'll find everything you need to take your projects to the next level.
MoSe2 Molybdenum Diselenide Sputtering Target is a high-quality thin film deposition material used in various applications in the semiconductor, solar cell, and electronics industries. This sputtering target is made from pure MoSe2 Molybdenum Diselenide material, ensuring excellent film quality and uniformity during the sputtering process.
MoSe2 Molybdenum Diselenide is a two-dimensional layered material with a unique structure that offers excellent electrical, optical, and mechanical properties. It is widely used as a semiconductor material in electronic devices and optoelectronic applications due to its high electron mobility, excellent photoconductivity, and optical absorption properties.
The MoSe2 Molybdenum Diselenide Sputtering Target is engineered to provide optimal performance and reliability in thin film deposition processes. It has a high purity level, low impurity content, and uniform grain structure, ensuring consistent film growth and high film quality.
The sputtering target is available in various sizes and shapes to meet different sputtering system requirements. It is compatible with magnetron sputtering, RF sputtering, and other deposition techniques, making it a versatile material for various thin film deposition applications.
The MoSe2 Molybdenum Diselenide Sputtering Target is commonly used in the fabrication of semiconductor devices, solar cells, optical coatings, and electronic components. It is suitable for depositing thin films with precise thickness, uniformity, and optical properties, making it an essential material for advanced thin film technology.
Key features of MoSe2 Molybdenum Diselenide Sputtering Target include: - High purity MoSe2 Molybdenum Diselenide material - Uniform grain structure for consistent film growth - Excellent electrical and optical properties - Suitable for various sputtering techniques - Compatible with different substrate materials - Available in custom sizes and shapes
Applications of MoSe2 Molybdenum Diselenide Sputtering Target include: - Thin film deposition in semiconductor manufacturing - Fabrication of optoelectronic devices - Solar cell coating applications - Optical coating and thin film research - Advanced electronics and device fabrication
Overall, the MoSe2 Molybdenum Diselenide Sputtering Target is a high-performance material for thin film deposition applications, offering excellent film quality, uniformity, and reliability. Its unique properties make it a valuable material for a wide range of industries and research fields, driving innovation and advancement in thin film technology.
Chemical formula：MoSe2
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
