Boost Your Sputtering Efficiency with Our NiFe2O4 Nickel Ferrite Sputtering Target! The High-Quality Material Provides Excellent Conductivity and Durability. Order Now for Optimal Performance and Longevity.
Product Details:
- Product Name: NiFe2O4 Nickel Ferrite Sputtering Target
- Product Type: High-quality Sputtering Target
- Material: Nickel Ferrite (NiFe2O4)
- Conductivity: Excellent
- Durability: High
- Performance: Optimal
- Longevity: Promised
- Applicable Groups: Researchers, Engineers, Scientists, and Technicians
- Applicable Scenarios: Research and Development, Industrial Applications, and Material Sciences
- Cost Performance: High
- Benefits: Provides efficient and long-lasting performance, Suitable for various sputtering applications, Consistent quality and purity ensures reproducible results.
Introducing our high-quality NiFe2O4 Nickel Ferrite Sputtering Target that promises to enhance your sputtering efficiency. This target is designed using nickel ferrite material to deliver optimal conductivity and durability. With excellent performance and longevity, our sputtering target promises consistent quality and purity to ensure reproducible results.
Our NiFe2O4 Nickel Ferrite Sputtering Target is suitable for use in a variety of applications, including research and development, industrial applications, and material sciences. It is beneficial to researchers, engineers, scientists, and technicians seeking to improve their sputtering efficiency.
This sputtering target provides efficient and long-lasting performance that maximizes results in various scenarios. With high cost-performance, our product offers great value for money.
In conclusion, if you are looking for a high-quality sputtering target that delivers excellent performance, our NiFe2O4 Nickel Ferrite Sputtering Target is the perfect choice. Order now to enjoy the benefits of efficient sputtering in your work.
Our NiFe2O4 Nickel Ferrite Sputtering Target is a high-quality material designed for use in thin film deposition processes for applications in the electronics, semiconductor, and solar industries. This sputtering target is composed of nickel and iron oxide (NiFe2O4) and offers excellent physical and chemical properties that make it ideal for use in magnetron sputtering systems.
Nickel ferrite is a type of ferrimagnetic material that exhibits magnetic properties, making it suitable for various magnetic and magneto-optical applications. The NiFe2O4 Nickel Ferrite Sputtering Target is specifically engineered to provide a uniform and consistent film deposition for thin film coatings. It has a high density, purity, and excellent sputtering performance, ensuring optimal results in the deposition process.
With a composition of nickel and iron oxide, this sputtering target offers exceptional magnetic and electrical properties, making it suitable for use in applications such as magnetic recording media, magnetic sensors, magnetic storage devices, and magnetic shielding. The material's high saturation magnetization and low coercivity make it an excellent choice for producing high-quality thin films with superior magnetic properties.
Our NiFe2O4 Nickel Ferrite Sputtering Target is available in various shapes and sizes to fit different sputtering systems and requirements. Whether you need a standard round target or a custom-made shape, we can provide you with the right product that meets your specific needs. Our sputtering targets are manufactured using advanced production techniques to ensure high purity, density, and uniformity, resulting in consistent and reliable performance.
In addition to its magnetic properties, the NiFe2O4 Nickel Ferrite Sputtering Target also offers excellent chemical stability, wear resistance, and thermal conductivity. These characteristics make it suitable for use in a wide range of deposition processes, including thin film deposition, sputtering, and magnetron sputtering. The target's high thermal conductivity allows for efficient heat dissipation during the deposition process, resulting in high-quality film coatings.
Our NiFe2O4 Nickel Ferrite Sputtering Target is compatible with a variety of sputtering systems, including DC magnetron sputtering, RF sputtering, and pulsed-DC sputtering. Its high sputtering rate and uniform film deposition ensure consistent film quality and thickness control, making it an excellent choice for research, development, and production applications.
Overall, our NiFe2O4 Nickel Ferrite Sputtering Target offers exceptional performance, quality, and reliability for thin film deposition processes. With its excellent magnetic and electrical properties, chemical stability, and thermal conductivity, this sputtering target is a superior choice for various applications in the electronics, semiconductor, and solar industries. Contact us today to learn more about our NiFe2O4 Nickel Ferrite Sputtering Target and how it can benefit your thin film deposition processes.
Chemical formula：NiFe2O4
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
