Sb2Se3 Antimony Selenide Sputtering Target

The Sb2Se3 Antimony Selenide Sputtering Target is a high-quality, precision-engineered material designed for use in thin film coating applications such as physical vapor deposition (PVD), pulsed laser deposition (PLD), and liquid crystal display (LCD) manufacturing processes. This sputtering target is composed of the compound Antimony Selenide (Sb2Se3), which is a semiconductor material with unique properties that make it ideal for a wide range of electronic and optical applications.

The Sb2Se3 Antimony Selenide Sputtering Target is produced using advanced manufacturing techniques to ensure a high level of purity and consistency. This ensures that the target will provide reliable performance and consistent results when used in sputtering processes. The target is available in a variety of sizes and configurations to accommodate different sputtering systems and processes.

One of the key advantages of using the Sb2Se3 Antimony Selenide Sputtering Target is its excellent optical and electrical properties. Sb2Se3 is a direct bandgap semiconductor with a bandgap energy of around 1.2 eV, making it ideal for use in optoelectronic devices such as photodetectors, solar cells, and light-emitting diodes (LEDs). The target also exhibits good electrical conductivity, making it suitable for use in thin film transistors and other electronic devices.

In addition to its optical and electrical properties, Sb2Se3 is also known for its thermal stability and chemical resistance. This makes it well-suited for use in high-temperature deposition processes and in environments where the target may be exposed to corrosive gases or other contaminants. The target is designed to withstand the rigors of sputtering processes, providing a long service life and consistent performance over time.

The Sb2Se3 Antimony Selenide Sputtering Target is compatible with a wide range of sputtering systems, including magnetron sputtering, ion beam sputtering, and RF sputtering. It can be used to deposit uniform, high-quality thin films on a variety of substrate materials, including glass, silicon, and metal foils. The target is easy to install and maintain, with a durable design that minimizes downtime and maximizes productivity.

Overall, the Sb2Se3 Antimony Selenide Sputtering Target is a versatile and reliable material that offers excellent performance in a variety of thin film coating applications. Whether you are manufacturing electronic devices, optical components, or advanced coatings, this sputtering target can help you achieve the high-quality results you need. Invest in the Sb2Se3 Antimony Selenide Sputtering Target today and take your thin film coating processes to the next level.

- Applicable Groups:

Sb2Se3 Antimony Selenide Sputtering Target is ideal for the following groups:

- Semiconductor industry professionals

- Solar cell manufacturers

- Research institutes

- Universities

- Applicable Scenarios:

Sb2Se3 Antimony Selenide Sputtering Target is ideal for the following scenarios:

- Thin film deposition

- PVD (Physical Vapor Deposition)

- Magnetron sputtering

- Semiconductor fabrication

- Solar cell manufacturing

Chemical formula：Sb2Se3

Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity