Our TiO2 sputtering target is tailored for semiconductor manufacturers and material scientists who require high-quality thin films for various applications. It is suitable for use in the production of microelectronics, optoelectronics, and photovoltaics, among other applications.
The TiO2 white titanium dioxide sputtering target is a high-quality material that is specifically designed for use in thin film coating applications. This target is made from pure titanium dioxide, a white pigment that is known for its excellent optical properties and high refractive index. It is commonly used in a variety of industries, including electronics, optics, and solar technology.
This sputtering target is ideal for use in a range of thin film coating processes, including physical vapor deposition (PVD), pulsed laser deposition (PLD), and liquid crystal display (LCD) production. It is capable of producing thin films with excellent adhesion, uniformity, and optical clarity, making it a versatile choice for a wide range of applications.
When used in PVD processes, the TiO2 white titanium dioxide sputtering target can be used to create thin films with a high refractive index, making them ideal for use in optical coatings and anti-reflective coatings. Its excellent optical properties make it a popular choice for applications where high optical clarity and UV resistance are required.
In PLD applications, this sputtering target can be used to deposit thin films with precise control over thickness and composition. This makes it an ideal choice for applications where fine-tuning the properties of the thin film is essential, such as in the production of semiconductors or optical coatings.
LCD manufacturers can also benefit from using the TiO2 white titanium dioxide sputtering target in their production processes. This target can be used to deposit thin films with high optical clarity and uniformity, making it ideal for use in the production of high-quality display panels.
One of the key advantages of using the TiO2 white titanium dioxide sputtering target is its high purity and excellent film quality. This target is manufactured using a high-purity titanium dioxide powder, ensuring that the resulting thin films are free from impurities and defects. This helps to improve the overall performance and longevity of the coated surfaces.
Overall, the TiO2 white titanium dioxide sputtering target is a versatile and high-quality material that is ideal for use in a variety of thin film coating applications. Its excellent optical properties, high purity, and uniformity make it a popular choice for industries that require high-performance coatings. Whether used in PVD, PLD, or LCD production, this sputtering target can help to enhance the performance and durability of thin film coatings.
Chemical formula：white
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,RectangleCurrently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
