Introducing TiOx- the ultimate choice for precision manufacturing! Made from high-quality titanium oxide, this advanced rotary sputtering target offers exceptional performance and versatility, making it perfect for custom coating and high-tech manufacturing processes.
Product Details:
TiOx is a premium-grade rotary sputtering target made from high-quality titanium oxide. This product is specifically designed for precision manufacturing and offers exceptional performance for custom coating and high-tech manufacturing processes.
Product Features:
- High-quality titanium oxide
- Advanced rotary sputtering target
- Exceptional performance and versatility
- Perfect for custom coating and high-tech manufacturing processes
- Powerful composition for outstanding results
Applicable Groups:
This product is suitable for a wide range of industries, including:
- Aerospace and Defense
- Semiconductor Manufacturing
- Precision Engineering
- Optics and Photonics
- Renewable Energy
Applicable Scenarios:
TiOx is ideal for a variety of applications, including:
- Thin Film Coating
- Photovoltaic (Solar) Cell Production
- Microelectronics Manufacturing
- Flat Panel Display Production
- Optical Coating
Cost Performance:
TiOx offers excellent cost performance, providing exceptional results for custom coating and high-tech manufacturing processes at a competitive price point. Its powerful composition delivers outstanding performance, making it an ideal choice for anyone seeking to take their production to the next level.
Order Your TiOx Today:
Experience effortless, high-quality manufacturing like never before with TiOx. Place your order today and take the first step toward precision manufacturing excellence.
Our TiOx Titanium Oxide Rotary Sputtering Target is a high-quality thin film deposition material designed for use in a variety of sputtering applications. Made from pure titanium oxide, this target offers excellent performance and durability, making it ideal for producing thin films with uniform thickness and outstanding adhesion properties.
With a purity of 99.99%, our TiOx Titanium Oxide Rotary Sputtering Target ensures high material utilization and deposition rates, resulting in cost-effective thin film production. It is available in a range of sizes and thicknesses to suit different sputtering systems and process requirements, allowing for greater flexibility and versatility in your thin film fabrication processes.
One of the key advantages of using our TiOx Titanium Oxide Rotary Sputtering Target is its excellent film quality and uniformity. The high purity of the material ensures that the resulting thin films are free from impurities and defects, resulting in superior optical and mechanical properties. This makes it ideal for applications in the fields of optics, electronics, and energy storage, where thin film quality is critical for device performance.
In addition, our TiOx Titanium Oxide Rotary Sputtering Target offers exceptional target life and stability, thanks to its advanced manufacturing process and quality control measures. This ensures consistent performance over multiple deposition cycles, reducing downtime and maintenance costs associated with target replacement.
Furthermore, the high thermal conductivity and low thermal expansion coefficient of our TiOx Titanium Oxide Rotary Sputtering Target allow for efficient heat dissipation and uniform film growth, even in high-power sputtering processes. This results in improved film uniformity and deposition rates, leading to higher productivity and yield in thin film manufacturing.
Our TiOx Titanium Oxide Rotary Sputtering Target is compatible with a wide range of sputtering systems, including magnetron sputtering, RF sputtering, and DC sputtering, making it suitable for various deposition techniques and substrates. Whether you are working on research and development projects or large-scale production runs, our target will meet your thin film deposition needs with outstanding performance and reliability.
Overall, our TiOx Titanium Oxide Rotary Sputtering Target is the ideal choice for producing high-quality thin films with excellent optical, electrical, and mechanical properties. Its high purity, uniformity, and stability make it a top choice for researchers, engineers, and manufacturers looking to achieve superior thin film performance in their applications. Invest in our TiOx Titanium Oxide Rotary Sputtering Target today to elevate your thin film deposition processes to new heights of quality and efficiency.
Chemical formula：TiOx
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
