Introducing our high-quality YSZ Yttria Stabilized Zirconia Sputtering Target, optimized for your advanced thin-film deposition needs. With outstanding purity and density, this target is ideal for high-tech manufacturing processes in the semiconductor, medical, and aerospace industries.
Product Features:
- High-quality YSZ Yttria Stabilized Zirconia Sputtering Target
- Optimized for advanced thin-film deposition needs
- Outstanding purity and density
- Ideal for high-tech manufacturing processes in the semiconductor, medical, and aerospace industries
Applicable Groups:
- Engineers and scientists involved in thin film deposition
- Manufacturers in the semiconductor, medical, and aerospace industries
Applicable Scenarios:
- Thin film deposition projects requiring exceptional precision and purity
- High-tech manufacturing processes with stringent quality control requirements
Cost Performance:
- The YSZ Yttria Stabilized Zirconia Sputtering Target offers exceptional cost performance, providing a high-quality product at a competitive price point.
- Its outstanding purity and density contribute to superior efficiency and cost-effectiveness in advanced thin-film deposition processes.
Technical Specifications:
- Composition: Yttria Stabilized Zirconia
- Purity: 99.99%
- Density: ≥ 6.0 g/cm3
- Grain Size: ≤ 100µm
- Shape: Disc, Plate, Column, Step, Customized
Benefits:
- Elevate productivity with the best YSZ target in the industry and achieve exceptional results
- Outstanding purity and density ensures superior thin-film deposition performance and efficiency
- Customized shapes available for a wide range of applications and requirements
Conclusion:
Introducing our YSZ Yttria Stabilized Zirconia Sputtering Target – the ideal solution for advanced thin-film deposition needs in the semiconductor, medical, and aerospace industries. Offering exceptional purity and density, this high-quality target ensures superior performance and efficiency in a wide range of thin film deposition projects. Customized shapes are available for a variety of applications and requirements, and the competitive price point provides outstanding cost performance. Elevate your productivity with the best YSZ target on the market and achieve exceptional results.
The YSZ Yttria Stabilized Zirconia Sputtering Target is a high-quality thin film coating material that is commonly used in a variety of applications in the electronics, optics, and industrial sectors. This sputtering target is composed of ZrO2, also known as zirconium dioxide, which is a highly stable and versatile material that offers exceptional properties for coating applications.
One of the key features of the YSZ Yttria Stabilized Zirconia Sputtering Target is its fully stabilized 8mol% Y2O3 composition. The addition of yttria, also known as yttrium oxide, to zirconia helps to enhance the stability, mechanical strength, and thermal conductivity of the material. This makes the sputtering target highly suitable for use in demanding thin film coating processes that require exceptional durability and performance.
The YSZ Yttria Stabilized Zirconia Sputtering Target is specifically designed for use in sputtering processes, which involve depositing a thin film coating onto a substrate through the application of a high-energy plasma. This results in a highly uniform and dense coating that is ideal for a wide range of applications, including optical coatings, protective coatings, and wear-resistant coatings.
With a fully stabilized 8mol% Y2O3 composition, this sputtering target offers superior performance and reliability in sputtering processes. The material is highly resistant to chemical and thermal degradation, making it suitable for use in harsh environments and high-temperature applications. Additionally, the YSZ Yttria Stabilized Zirconia Sputtering Target exhibits excellent adhesion to a variety of substrate materials, ensuring a durable and long-lasting coating.
The YSZ Yttria Stabilized Zirconia Sputtering Target is available in a range of sizes and configurations to suit various sputtering systems and applications. Whether you are looking to deposit a thin film coating on a small or large substrate, this sputtering target can be customized to meet your specific requirements. Additionally, the material can be easily integrated into existing sputtering processes, allowing for seamless and efficient deposition of thin film coatings.
In conclusion, the YSZ Yttria Stabilized Zirconia Sputtering Target is a versatile and reliable thin film coating material that offers exceptional performance in sputtering applications. With its ZrO2 composition and fully stabilized 8mol% Y2O3 formulation, this sputtering target provides superior stability, mechanical strength, and thermal conductivity, making it an ideal choice for a wide range of coating applications. Whether you are looking to enhance the performance of your optics, electronics, or industrial components, the YSZ Yttria Stabilized Zirconia Sputtering Target is the perfect solution for achieving durable and high-quality thin film coatings.
Chemical formula：YSZ
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
