ZnO Sputtering Target

Product Name: Zinc Oxide Sputtering Target

Introducing our Zinc Oxide Sputtering Target – the ultimate choice for professionals seeking unrivaled performance in the field of sputtering. Our product stands out for its meticulous attention to detail, ensuring top quality and efficiency in all your sputtering tasks. Truly a global leader in the field, our Zinc Oxide Sputtering Target is trusted by researchers, developers, manufacturers, and businesses worldwide, making it the ideal solution to upgrade your work. Get yours now and experience the difference first-hand!

Product Features:

- High Purity: Our Zinc Oxide Sputtering Target is made from high-purity material, ensuring quality and consistent performance in all your sputtering tasks.

- Stable and Durable: Our product is designed to be stable and durable, providing long-lasting performance even under the most demanding conditions.

- Consistent Composition: Our Zinc Oxide Sputtering Target has a consistent composition, ensuring that it performs consistently over time, without any material or performance issues.

- Customizable shape and size: Choose from up to six shapes and sizes to ensure a perfect fit for your specific sputtering application.

Applicable Groups:

Our Zinc Oxide Sputtering Target is ideal for researchers, developers, manufacturers, and businesses across industries such as semiconductor manufacturing, photonics, nanotechnology, and more.

Applicable Scenarios:

Our Zinc Oxide Sputtering Target is perfect for use in applications such as:

- Solar Cells: Our product is designed for use in the development and manufacture of solar cells.

- Optoelectronics: Our Zinc Oxide Sputtering Target can be used in the development of optoelectronic devices such as photodetectors and LEDs.

- Thin Film Deposition: Our product is suitable for thin film deposition processes, including the deposition of transparent conductive oxide (TCO) layers.

Cost Performance:

Our Zinc Oxide Sputtering Target offers superior performance and value, providing a cost-effective solution for your sputtering needs. With a range of shapes and sizes available to choose from, you can select the perfect product for your application without breaking the bank.

In conclusion, our Zinc Oxide Sputtering Target is the go-to choice for professionals looking for exceptional quality, durability, and consistency in their sputtering tasks across a wide range of applicable scenarios. Upgrade your work today and experience the difference for yourself!

ZnO Zinc Oxide Sputtering Target is a high-quality material that is widely used in various industries for sputtering applications. This sputtering target is made of pure zinc oxide (ZnO) and is designed to provide excellent performance and durability during the sputtering process.

The ZnO Zinc Oxide Sputtering Target is a key component in thin film deposition processes, which are used to create thin films of material on a substrate. Sputtering is a common technique used in electronics, optics, and other industries to deposit thin films with precise thickness and composition. The ZnO Zinc Oxide Sputtering Target is specifically designed for use in sputtering systems, where a high-energy source is used to eject material from the target and deposit it on the substrate.

One of the key benefits of using ZnO Zinc Oxide Sputtering Target is its high purity and uniform composition. The sputtering target is made of pure zinc oxide, which ensures that the deposited thin films will have consistent properties and exhibit excellent performance. This high purity also helps to minimize defects and ensure high-quality film deposition.

In addition to its high purity, the ZnO Zinc Oxide Sputtering Target also offers excellent thermal and chemical stability. This makes it suitable for use in a wide range of sputtering environments, including high-temperature and reactive environments. The sputtering target is designed to withstand the rigors of the sputtering process, ensuring reliable and consistent performance over time.

Another important feature of the ZnO Zinc Oxide Sputtering Target is its excellent sputtering efficiency. The target is designed to have a high sputtering rate, which means that it can deposit thin films onto the substrate quickly and efficiently. This high sputtering efficiency helps to reduce processing time and increase productivity, making the sputtering target an ideal choice for high-throughput sputtering applications.

The ZnO Zinc Oxide Sputtering Target is available in various sizes and configurations to meet the specific requirements of different sputtering systems. The target can be customized to fit different target holder configurations, ensuring compatibility with a wide range of sputtering equipment. This flexibility makes the ZnO Zinc Oxide Sputtering Target suitable for use in both research and production environments.

Overall, the ZnO Zinc Oxide Sputtering Target is a high-quality material that offers excellent performance, durability, and efficiency for sputtering applications. Its high purity, thermal and chemical stability, and sputtering efficiency make it an ideal choice for thin film deposition processes in a variety of industries. Whether you are conducting research or manufacturing thin films for commercial applications, the ZnO Zinc Oxide Sputtering Target is a reliable and cost-effective solution for your sputtering needs.

ZnO Sputtering Target

Product Name : Zinc Oxide

Formula: ZnO

Molar mass: 81.38 g/mol

Density: 5.61 g/cm³

Melting point: 3,587°F (1,975°C)

Boiling point: 4,280°F (2,360°C)

Purity: 99.99% ; 99.999%

Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature

Shape :Disc,Rectangle

Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size /Tolerance ( or drawing )

2. Purity

3. Quantity